• RHEED Systems 10 - 60 keV systems with remote control, Beam Blanking, Beam Rocking, Differential Pumping, computer control.

    • For in situ surface analysis
    • For material growth in UHV (MBE)
    • For high pressure and reactive gas applications, Torr RHEED™

  • RHEED Imaging Analyzer

    • RHEED diagram energy filtering
    • High energy in-situ ELS

  • RHEED Accessories

    • Phosphorus screens
    • Shutters
    • Pattern aligner

  • Acquisition, imaging, and control software for Windows™ 2000 and XP:

    • Fast video data acquisition and analysis
    • Scanning electron microscopy software and control
    • Scanning AUGER microscopy software and control
    • Computer control for electron guns
    • Spectrometer control and acquisition software

  • Energy Spectrometers - Highest sensitivity and largest working distance for:

    • AES
    • SAM
    • XPS
    • UPS
    • ELS
    • ISS

  • Electron Guns and Sources

    • Low energy sources from 1 - 500 eV
    • Medium energy sources up to 10 keV
    • High energy sources up to 125 keV
    • Fine focus sources with to 200 nm spot size
    • High resolution SEM down to 40 nm
    • High power electron guns
    • Flood guns
    • General purpose sources and guns

  • Photo electron emission microscope (PEEM)

    • Modular microscope with high lateral resolution, Energy Filtering and UV Spectroscopy

  • Ion induced electron emission microscope IEEM

    • Won R&D 100 award in 2001

  • Ion sources

  • Vacuum systems - STAIB INSTRUMENTS has a long term experience in development and design of:

    • STAIB multi-technique systems
    • Custom design systems

  • Some products are trade mark registered or patented, list available